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장비 소개

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장비 소개 / 가속기 제원

Accelerator 6 MV Tandetron 2 MV Pelletron 400 kV implanter
Type HVEE Tandem Dynamitron NEC Tandem VDG HVEE Single ended C-W
Ion sources
  • SO-110 (2)
  • Duoplasmatron
  • SNICS
  • Alphatros
  • Hollow cathode
  • Cold-penning
Voltage Range [MV] 0.4 – 6.2 0.2 – 2.0 0.2 – 0.4
Commissioned 2013 1995 2013
Appl. AMS 10Be, 14C, 26Al, 36Cl, 41Ca 129I, TEAMS
IBA RBS, ERD, PIXE, external-beam, μ-probe RBS, ERD, PIXE MEIS
IBMM (4” wafer) (2”ⅹ2”) (4” wafer)