RBS/ERD 이미지

RBS/ERD

Model
NEC
Location
가속1004호
Tel
02-958-5995

2MV Accelerator is used for ion beam analysis, such as RBS(Rutherford Back Scattering)/channeling, ERD(Elastic Recoil Detection) and PIXE(Proton Induced X-ray Emission). RBS is used for quantitaive depth profiling of sample with a non-destructive manner. CHanneling provides crystallinity and damage information of highly textured thin film. ERD is useful technique for the light element depth profiling. PIXE(Proton Induced X-ray Emission) is the best for the analysis of thin film samples, surface layers and samples with limited amounts of materials.

Specifications

  • RBS/ERD Specifications

  • -Range of elements : H~ Bi

  • -Detection limits : 1~10 at%(low Z)

  • 1~100ppm(high Z)

  • -Depth resolution : 10 nm(RBS)

  • -Maximum depth : 2 micron

  • -B,C,N,O resonance scattering

  • PIXE Specifications

  • -Range of elements : Mg~ Bi

  • -Detection limits : 0.1~10 ppm(thin film)

  • 1~100ppm(bulk)

  • -Accuracy: 2~10 % with standards

  • -Maximum depth : 10 micron

  • -Si(Li) detector : resolution 155 eV for 5.9 KeV

Application examples

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장비명

RBS/ERD

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