FIB (Nova) 이미지

FIB (Nova)

Model
Nova 600 NanoLab
Location
5115A
Tel
02-958-5985

Dual Beam Focused Ion Beam has multitude of capabilities including high resolution electron imaging, ion imaging, nano device fabrication and material deposition. Simultaneous patterning and imaging is possible with nm resolution for both imaging and machining. Using software control, digital pattern can be directly applied and unattended operation with high repeatability can be employed for TEM sample preparation.

Specifications

  • Manufacturer : FEI (Nova 600 NanoLab)

  • Accelerating Voltage : 5 ~ 30 kV

  • Image Resolution : < 1.1 nm (Ga ions)

  • Electron Probe size : < 5 nm

  • Magnification : 25 ~ 1,000,000 X

  • Stage : 6, Piezo linear motor control

Applications

  • SE/ BSE/ Ion image

  • Electron / ion beam deposition

  • Ion beam milling

  • Slice & View

  • Nano patterning

Application examples

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장비명

FIB (Nova)

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