This diffractometer provides overall evaluation of surfaces and thin film. It allows you to analyze film thickness, surface roughness, and thin film internal structure. The incidence optics uses a parabolically curved artificial multilayer to obtain a strong parallel beam. When a beam parallelized by a multilayer is allowed to enter a four-crystal monochromator, you can obtain an X-ray beam that is further monochromatized and paralled. In such an instance, you can make crystallinity analysis (lattice constants, orientation, composition, and strain) of single-crystal thin films, and super lattice elements that are epitaxially grown relative to a substrate, film thickness evaluation, super lattice period analysis, and reciprocal lattice intensity map measurements.
Max. power : 18 kW (60 kV, 300 mA)
Using power : 12 kW (40 kV, 300 mA)
X-ray target : Cu
Goniometer radius : 300 mm
Optics: Parabolic multi-layer crystal, 2-channel cut Ge (220),
4-channel cut Ge (220), Analyzer
2 scan range : -3° ~ 158°
XRR (X-ray reflectivity)
RC (Rocking curve, (2theta-omega, omega))
RSM (Reciprocal space mapping)
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